JPH0254662B2 - - Google Patents
Info
- Publication number
- JPH0254662B2 JPH0254662B2 JP57223614A JP22361482A JPH0254662B2 JP H0254662 B2 JPH0254662 B2 JP H0254662B2 JP 57223614 A JP57223614 A JP 57223614A JP 22361482 A JP22361482 A JP 22361482A JP H0254662 B2 JPH0254662 B2 JP H0254662B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- silicon film
- base
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57223614A JPS59112655A (ja) | 1982-12-18 | 1982-12-18 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57223614A JPS59112655A (ja) | 1982-12-18 | 1982-12-18 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59112655A JPS59112655A (ja) | 1984-06-29 |
JPH0254662B2 true JPH0254662B2 (en]) | 1990-11-22 |
Family
ID=16800954
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57223614A Granted JPS59112655A (ja) | 1982-12-18 | 1982-12-18 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59112655A (en]) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61131562A (ja) * | 1984-11-30 | 1986-06-19 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH0669044B2 (ja) * | 1985-04-26 | 1994-08-31 | 富士通株式会社 | 半導体装置の製造方法 |
US4898838A (en) * | 1985-10-16 | 1990-02-06 | Texas Instruments Incorporated | Method for fabricating a poly emitter logic array |
JPH0611055B2 (ja) * | 1985-11-13 | 1994-02-09 | 三菱電機株式会社 | 半導体装置の製造方法 |
JP2000252294A (ja) | 1999-03-01 | 2000-09-14 | Nec Corp | 半導体装置及びその製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5563821A (en) * | 1978-11-06 | 1980-05-14 | Nec Corp | Semiconductor device |
-
1982
- 1982-12-18 JP JP57223614A patent/JPS59112655A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59112655A (ja) | 1984-06-29 |
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